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Advances in Chemical Mechanical Planarization (CMP) Suryadevara Hardback

£161.99

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Advances in Chemical Mechanical Planarization (CMP)

This comprehensive book on chemical mechanical planarization provides a presentation of the fundamentals and advances in CMP and the latest techniques in the science

Babu Suryadevara (Edited by)

9780081001653, Elsevier Science

Hardback, published 19 January 2016

536 pages

22.9 x 15.2 x 3.1 cm, 0.69 kg

Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects.

This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP ]

Advances in Chemical Mechanical Planarization (CMP) Suryadevara Hardback

Advances in Chemical Mechanical Planarization (CMP)

This comprehensive book on chemical mechanical planarization provides a presentation of the fundamentals and advances in CMP and the latest techniques in the science

Babu Suryadevara (Edited by)

9780081001653, Elsevier Science

Hardback, published 19 January 2016

536 pages

22.9 x 15.2 x 3.1 cm, 0.69 kg

Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects.

This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP ]

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